Company Filing History:
Years Active: 2024
Title: The Innovations of Chamara Abeysekera
Introduction
Chamara Abeysekera is an accomplished inventor based in Hillsboro, OR (US). She has made significant contributions to the field of electronics, particularly in the development of capacitors. Her innovative work has led to the granting of a patent that showcases her expertise and creativity.
Latest Patents
Chamara holds a patent for a Metal Insulator Metal (MIM) capacitor. This invention describes a capacitor that includes a first electrode plate, with a first capacitor dielectric positioned on it. A second electrode plate is placed over and parallel to the first electrode plate, along with a second capacitor dielectric. Additionally, a third electrode plate is situated on the second capacitor dielectric, maintaining parallel alignment with the second electrode plate, followed by a third capacitor dielectric. Finally, a fourth electrode plate is positioned on the third capacitor dielectric, also in parallel alignment. In another embodiment, the capacitor features a first electrode, a capacitor dielectric, and a second electrode, with the dielectric comprising alternating layers of first and second dielectrics.
Career Highlights
Chamara is currently employed at Intel Corporation, where she continues to push the boundaries of technology and innovation. Her work at Intel has allowed her to collaborate with some of the brightest minds in the industry, contributing to advancements in electronic components.
Collaborations
Chamara has worked alongside notable colleagues, including Aaron J Welsh and Christopher M Pelto. These collaborations have fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies.
Conclusion
Chamara Abeysekera is a remarkable inventor whose contributions to the field of electronics are noteworthy. Her patent for the Metal Insulator Metal capacitor exemplifies her innovative spirit and dedication to advancing technology. Through her work at Intel Corporation and collaborations with talented colleagues, she continues to make a significant impact in her field.