Socorro, NM, United States of America

Chad S Watson

This inventor holds 1 USPTO granted patent. Top assignee: New Mexico Tech Research Foundation. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chad S Watson. Retrieved from https://idiyas.com/inventor/chad-s-watson-puxpy9bd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Chad S Watson: Innovator in Anodic Bonding Technology

Introduction

Chad S Watson is a notable inventor based in Socorro, NM (US). He has made significant contributions to the field of materials science, particularly in the area of anodic bonding. His innovative approach has led to the development of a unique method for bonding glass and semiconducting materials.

Latest Patents

Chad holds a patent for a "Method for anodically bonding glass and semiconducting material together." This method involves immersing a glass sample in a molten salt bath to modify its surface through ion exchange. The process utilizes a lithium salt or a proton source, followed by heating the glass and semiconducting material together while applying a potential to achieve anodic bonding.

Career Highlights

Chad is associated with the New Mexico Tech Research Foundation, where he continues to explore advancements in material bonding techniques. His work has implications for various applications in electronics and photonics, showcasing his commitment to innovation in technology.

Collaborations

Chad has collaborated with esteemed colleagues, including Deidre Hirschfeld and W Kent Schubert. Their combined expertise has contributed to the success of their research initiatives.

Conclusion

Chad S Watson's contributions to anodic bonding technology exemplify the spirit of innovation in materials science. His patent and ongoing research reflect a dedication to advancing the field and improving technological applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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