Missoula, MT, United States of America

Chad Fero

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: Innovations by Chad Fero in Chemical Vapor Deposition Technology

Introduction

Chad Fero is an accomplished inventor based in Missoula, MT (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technology, holding 2 patents that focus on stabilizing filaments within CVD reactors. His innovative methods aim to enhance the efficiency and reliability of these systems.

Latest Patents

Chad Fero's latest patents include a "Method for stabilizing filaments in a chemical vapor deposition reactor." This method involves providing a pair of filaments and connecting them with at least one stabilizer, which may consist of an electronically insulating material. Another patent, titled "Methods and systems for stabilizing filaments in a chemical vapor deposition reactor," describes various systems, methods, and apparatus for stabilizing filaments. This system features a base plate with multiple electrical connections, a pair of filaments extending from the base plate, and a stabilizer that connects the filaments. Each filament is in electrical contact with two electrical connections, ensuring a conductive path.

Career Highlights

Throughout his career, Chad has worked with notable companies, including Oci Company Ltd. His experience in the industry has allowed him to develop and refine his innovative approaches to CVD technology.

Collaborations

Chad has collaborated with talented individuals such as Wenjun Qin and Aaron Dean Rhodes. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Chad Fero's work in the field of chemical vapor deposition technology showcases his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing the stability and efficiency of CVD systems, marking him as a notable inventor in this domain.

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