The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2019
Filed:
Jun. 05, 2017
Applicant:
Oci Company Ltd., Seoul, KR;
Inventors:
Wenjun Qin, Missoula, MT (US);
Chad Fero, Missoula, MT (US);
Aaron D. Rhodes, Missoula, MT (US);
Jeffrey C. Gum, Stevensville, MT (US);
Assignee:
OCI COMPANY LTD., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C01B 33/035 (2006.01); C23C 16/24 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C01B 33/035 (2013.01); C23C 16/24 (2013.01); C23C 16/4418 (2013.01);
Abstract
A method is provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor. The method includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electronically insulating material.