Sunnyvale, CA, United States of America

Chacko C Neroth

This inventor holds 1 USPTO granted patent. Top assignee: Kla-Tencor Technologies Corporation. Active years: 2007.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Chacko C Neroth: Innovator in Defect Image Analysis

Introduction

Chacko C Neroth is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of defect image analysis, particularly in the semiconductor industry. His innovative approach has led to the development of a unique patent that enhances the efficiency of analyzing defect images.

Latest Patents

Chacko C Neroth holds a patent for an "Apparatus and methods for searching through and analyzing defect images and wafer maps." This invention discloses methods and apparatus for automatically organizing and analyzing a plurality of defect images without the need for a predefined set of classified images. The patent emphasizes sorting defect images based on associated identifying data, such as fabrication identifiers and lot numbers, rather than relying on a training set. This method allows for efficient searching of images that resemble a specified target image by comparing feature vectors.

Career Highlights

Chacko C Neroth is associated with Kla-Tencor Technologies Corporation, where he has been instrumental in advancing technologies related to defect image analysis. His work has contributed to improving the accuracy and efficiency of defect detection in semiconductor manufacturing processes.

Collaborations

Chacko has collaborated with notable colleagues, including David R Bakker and James L Belliveau. Their combined expertise has furthered the development of innovative solutions in the field.

Conclusion

Chacko C Neroth's contributions to defect image analysis through his patent demonstrate his commitment to innovation in the semiconductor industry. His work continues to influence the way defect images are analyzed and organized, paving the way for advancements in manufacturing processes.

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