Paris, France

Cédric Autie

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Safran Electronics & Defense. Active years: 2021-2022.


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2021-2022

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2 patents (USPTO):Explore Patents

Title: Cédric Autie: Innovator in Radiation Protection Technologies

Introduction

Cédric Autie is a notable inventor based in Paris, France. He has made significant contributions to the field of electronics, particularly in developing methods for protecting circuits against radiation. With a total of 2 patents, Autie's work is at the forefront of innovation in this critical area.

Latest Patents

Cédric Autie's latest patents include a method for producing a circuit optimized for protection against radiation. This production method involves a preliminary characterization stage on a reference circuit, which includes irradiating the circuit multiple times and mapping the impact of the irradiations. The optimization stage adapts the position of radiation-sensitive elements based on the mapping results. Another significant patent is a method for protecting an FPGA against natural radiation. This method defines constraining signals to ensure that the placement and routing tool does not overload any one zone of the FPGA's surface, thereby enhancing its resilience against radiation.

Career Highlights

Cédric Autie is currently employed at Safran Electronics & Defense, where he applies his expertise in developing advanced electronic systems. His innovative approaches have positioned him as a key player in the field of radiation protection technologies.

Collaborations

Cédric collaborates with Thibault Porteboeuf, working together to advance their research and development efforts in the electronics sector.

Conclusion

Cédric Autie's contributions to radiation protection technologies highlight his role as an influential inventor in the electronics industry. His innovative patents and collaborative efforts continue to pave the way for advancements in this essential field.

Profile summary based on public USPTO records.
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