Company Filing History:
Years Active: 2000-2007
Title: Cevdet Ismail Noyan: Innovator in Metal Conductor Technology
Introduction
Cevdet Ismail Noyan is a notable inventor based in Yorktown Heights, NY (US). He has made significant contributions to the field of metal conductors, holding a total of 3 patents. His work primarily focuses on developing advanced materials that enhance the performance of interconnect structures.
Latest Patents
One of his latest patents is titled "Ultra thin, single phase, diffusion barrier for metal conductors." This invention is directed to an alpha-W layer that is employed in interconnect structures such as trench capacitors or damascene wiring levels as a diffusion barrier layer. The alpha-W layer is a single phased material formed by a low temperature/pressure chemical vapor deposition process using tungsten hexacarbonyl, W(CO), as the source material. This innovative approach aims to improve the efficiency and reliability of electronic components.
Career Highlights
Cevdet Ismail Noyan is currently associated with International Business Machines Corporation (IBM), where he continues to push the boundaries of technology. His expertise in material science and engineering has positioned him as a key player in the development of next-generation electronic devices.
Collaborations
Throughout his career, Noyan has collaborated with esteemed colleagues, including John Jacob Yurkas and Stephan Alan Cohen. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Cevdet Ismail Noyan's contributions to the field of metal conductors and his innovative patents reflect his dedication to advancing technology. His work at IBM and collaborations with other experts highlight the importance of teamwork in driving innovation forward.