Cedrik Y Cole

Title: Cedrik Y Cole: Innovator in Metal Silicide Technology

Introduction

Cedrik Y Cole is a notable inventor based in Montreal, Canada. He has made significant contributions to the field of semiconductor technology, particularly in the stabilization of metal silicide films used in CMOS devices. His innovative approach has implications for the efficiency and reliability of electronic components.

Latest Patents

Cedrik holds a patent titled "Stabilization of Ni monosilicide thin films in CMOS devices using implantation of ions before silicidation." This patent describes a method for forming a stabilized metal silicide film that minimizes agglomeration during thermal treatments. The invention involves implanting ions into the silicon-containing layer before the formation of metal silicide, which helps to stabilize the film and prevent agglomeration at elevated temperatures.

Career Highlights

Cedrik is currently employed at International Business Machines Corporation (IBM), where he continues to work on advancements in semiconductor technology. His expertise in this area has positioned him as a valuable asset to his team and the broader field of electronics.

Collaborations

Cedrik has collaborated with notable colleagues, including Roy Arthur Carruthers and Christophe Detavernier. These partnerships have fostered innovation and contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Cedrik Y Cole's work in the stabilization of metal silicide films represents a significant advancement in semiconductor technology. His contributions are essential for the ongoing evolution of CMOS devices, ensuring their performance and reliability in modern electronics.