The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Oct. 20, 2006
Roy A. Carruthers, Stormville, NY (US);
Cedrik Y. Cole, Montreal, CA;
Christophe Detavernier, Denderleeuw, BE;
Christian Lavoie, Ossining, NY (US);
Kenneth P. Rodbell, Sandy Hook, CT (US);
Roy A. Carruthers, Stormville, NY (US);
Cedrik Y. Cole, Montreal, CA;
Christophe Detavernier, Denderleeuw, BE;
Christian Lavoie, Ossining, NY (US);
Kenneth P. Rodbell, Sandy Hook, CT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for forming a stabilized metal silicide film, e.g., contact (source/drain or gate), that does not substantially agglomerate during subsequent thermal treatments, is provided In the present invention, ions that are capable of attaching to defects within the Si-containing layer are implanted into the Si-containing layer prior to formation of metal silicide. The implanted ions stabilize the film, because the implants were found to substantially prevent agglomeration or at least delay agglomeration to much higher temperatures than in cases in which no implants were used.