This inventor holds 2 USPTO granted patents. Top assignee: Ekc Technology Inc.. Active years: 2002-2007.
Company Filing History:
Years Active: 2002-2007
Title: Catherine M Peyne: Innovator in Dual Damascene Fabrication
Introduction
Catherine M Peyne is a notable inventor based in Hayward, CA (US). She has made significant contributions to the field of semiconductor manufacturing, particularly in dual damascene fabrication. With a total of 2 patents, her work has been instrumental in advancing cleaning processes in this complex area of technology.
Latest Patents
Catherine's latest patents include innovative cleaning chemistries designed to enhance dual damascene systems. One of her patents focuses on a post etch cleaning composition that utilizes a choline compound, such as choline hydroxide. This invention addresses the challenges faced during dual damascene fabrication by incorporating an etch stop inorganic layer. This layer protects the underlying copper interconnect and facilitates improved cleaning. Another patent details a similar cleaning composition and process, emphasizing the importance of a two-step etch process that meets the stringent requirements of ULSI manufacturing.
Career Highlights
Catherine M Peyne is currently employed at EKC Technology Inc., where she continues to develop innovative solutions for the semiconductor industry. Her expertise in cleaning chemistries has positioned her as a key player in her field.
Collaborations
Catherine has collaborated with esteemed colleagues such as David J Maloney and Shihying Lee. Their combined efforts have contributed to the advancement of technologies in semiconductor manufacturing.
Conclusion
Catherine M Peyne's contributions to dual damascene fabrication through her innovative patents and collaborative efforts highlight her significant role in the semiconductor industry. Her work continues to influence the development of advanced cleaning processes, ensuring the efficiency and effectiveness of manufacturing techniques.