Company Filing History:
Years Active: 2011
Title: Cass X Shang: Innovator in Semiconductor Technology
Introduction
Cass X Shang is a prominent inventor based in Sunnyvale, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of residue removal processes. His innovative work has led to the development of a unique composition that addresses critical challenges in semiconductor manufacturing.
Latest Patents
Cass X Shang holds a patent for a "Semiconductor process residue removal composition and process." This composition includes 2-(2-aminoethylamino)-ethanol, along with at least one chelating agent and a corrosion inhibitor, combined with water. The invention is capable of effectively removing organic, organometallic, and metal oxide residues from semiconductor substrates. Additionally, it outlines a method for removing etching residue from these substrates.
Career Highlights
Throughout his career, Cass has demonstrated a strong commitment to advancing semiconductor technology. His work at Ekc Technology Inc. has positioned him as a key player in the industry. With a focus on innovation, he continues to explore new methods and compositions that enhance semiconductor manufacturing processes.
Collaborations
Cass has collaborated with notable colleagues, including Wai Mun Lee and Atsushi Otake. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in semiconductor technology.
Conclusion
Cass X Shang's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing processes.