This inventor holds 4 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2004-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004-2008
Title: Unveiling the Inventive Mind of Carsten Andreas Kohler
Introduction: Carsten Andreas Kohler, a skilled inventor based in Veldhoven, Netherlands, has made significant contributions to the field of lithography with four patented innovations under his belt.
Latest Patents:
1. "Lithographic processing method and device manufactured thereby": Kohler's innovative technique involves a double exposure processing method that expands mask patterns before exposure, providing precise patterns on device layers.
2. "Lithographic apparatus, device manufacturing method": In this patent, Kohler addresses birefringence in lithographic projection apparatus by measuring and compensating for mask birefringence, ensuring optimum polarization at the substrate level.
Career Highlights: Kohler's career at ASML Netherlands B.V. has been marked by a commitment to pushing the boundaries of lithographic technology. His expertise and inventive spirit have led to groundbreaking advancements in the industry.
Collaborations: Kohler has collaborated closely with colleagues such as Johannes Catharinus Hubertus Mulkens and Wilhelmus Petrus De Boeij. Together, they have worked on innovative projects that have shaped the landscape of lithography.
Conclusion: Carsten Andreas Kohler stands as a beacon of innovation in the field of lithography, with a track record of patents that showcase his ingenuity and dedication to advancing technological boundaries. His contributions continue to inspire and drive progress in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile