This inventor holds 2 USPTO granted patents. Top assignee: Stmicroelectronics S.r.l.. Active years: 2001-2007.
Location History:
- Vimercate, IT (2001)
- Sulbiate, IT (2007)
Company Filing History:
Years Active: 2001-2007
Title: The Innovative Contributions of Carmelo Romeo
Introduction
Carmelo Romeo is a notable inventor based in Sulbiate, Italy. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his expertise and innovative spirit. His work primarily focuses on methods for defining geometries in semiconductor wafers, which are crucial for various electronic applications.
Latest Patents
Carmelo's latest patents include a nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer. This method involves forming a reusable refractory coated laminar mask, which is positioned over the semiconductor wafer to facilitate treatments such as plasma etching or ion etching. Another significant patent is a process for the definition of openings in a dielectric layer. This process includes several steps, such as forming a layer of polysilicon over the dielectric layer and using it as a mask for etching, ultimately leading to the selective removal of materials to achieve desired geometries.
Career Highlights
Carmelo Romeo is currently employed at STMicroelectronics S.r.l., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing techniques that enhance the efficiency and effectiveness of semiconductor processing.
Collaborations
Carmelo collaborates with talented colleagues, including Lorena Beghin and Francesca Canali, who contribute to the innovative environment at STMicroelectronics. Their teamwork fosters a culture of creativity and technical excellence.
Conclusion
Carmelo Romeo's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the field. His work not only advances technology but also sets a foundation for future developments in semiconductor processing.