Carlos G Caminos

Title: The Innovative Contributions of Carlos G Caminos

Introduction

Carlos G Caminos is a notable inventor based in Lyndhurst, NJ (US). He has made significant contributions to the field of projection electron lithography, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

Caminos' latest patents include a process for fabricating a projection electron lithography mask and a removable, reusable cover designed for use therein. The removable cover is constructed to match the geometry of the active region of a projection electron lithography mask, ensuring it does not etch in the plasma environment used to remove photoresist. This cover effectively protects the active region of the mask without making contact, thereby preserving its integrity during the fabrication process. The technique he developed utilizes this cover to safeguard the active region from the plasma environment while maintaining its functionality.

Career Highlights

Carlos G Caminos has been associated with Agere Systems Guardian Corp., where he has applied his expertise in lithography and materials science. His work has contributed to advancements in the manufacturing processes of electronic components, enhancing the efficiency and effectiveness of lithography techniques.

Collaborations

Caminos has collaborated with notable coworkers such as Chester S Knurek and Anthony E Novembre, further enriching his professional experience and contributions to the field.

Conclusion

Carlos G Caminos stands out as an influential inventor in the realm of projection electron lithography. His innovative patents and contributions to Agere Systems Guardian Corp. reflect his commitment to advancing technology in this critical area.