The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
May. 15, 2001
Carlos G. Caminos, Lyndhurst, NJ (US);
Chester S. Knurek, Linden, NJ (US);
Anthony E. Novembre, Martinsville, NJ (US);
Agere Systems Guardian Corp., Orlando, FL (US);
Abstract
A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.