Chester S Knurek

Title: Chester S. Knurek: Innovator in Projection Electron Lithography

Introduction

Chester S. Knurek is a notable inventor based in Linden, NJ (US). He has made significant contributions to the field of projection electron lithography, holding a total of 2 patents. His work focuses on enhancing the fabrication processes of lithography masks, which are crucial in various technological applications.

Latest Patents

Knurek's latest patents include a process for fabricating a projection electron lithography mask and a removable, reusable cover designed for use with these masks. The removable cover is constructed to match the geometry of the active region of the lithography mask, ensuring it does not etch in the plasma environment used for photoresist removal. This innovative cover protects the active region without making contact, thereby preserving its integrity during the fabrication process.

Career Highlights

Chester S. Knurek has worked with Agere Systems Guardian Corp., where he has applied his expertise in lithography and mask fabrication. His contributions have been instrumental in advancing the technology used in this field.

Collaborations

Throughout his career, Knurek has collaborated with notable colleagues, including Carlos G. Caminos and Anthony E. Novembre. These partnerships have fostered innovation and development in their shared field of expertise.

Conclusion

Chester S. Knurek's work in projection electron lithography exemplifies the impact of innovative thinking in technology. His patents and collaborations continue to influence advancements in the industry.