Aptos, CA, United States of America

Carlo Ferrando

This inventor holds 1 USPTO granted patent. Top assignee: Intel Magnetics, Inc.. Active years: 1983.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Carlo Ferrando. Retrieved from https://idiyas.com/inventor/carlo-ferrando-n6l850uy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1983

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1 patent (USPTO):Explore Patents

Title: Carlo Ferrando: Semiconductor Process Inventor

Introduction

Carlo Ferrando is an inventor associated with Aptos, California, and Intel Magnetics, Inc. His patent work addresses a selective method for removing a liquid phase epitaxial layer from a wafer while preserving the underlying substrate.

Latest Patents

Ferrando is credited with 1 patent: “Process for Removing a Liquid Phase Epitaxial Layer from a Wafer.” The invention uses an etch melt substantially similar to the melt used to grow the epitaxial layer. By setting the melt’s temperature above the layer’s equilibrium temperature but below the substrate’s equilibrium temperature, the process removes the epitaxial material while leaving the substrate substantially unaffected. The wafer can then be reused without repolishing.

Career Highlights

Ferrando’s patent reflects work on semiconductor wafer processing and the selective removal of epitaxial material. The disclosed approach aims to preserve the wafer substrate and support its reuse.

Collaborations

Ferrando’s listed coworkers include Baylor B. Triplett and Guido Galli. His company affiliation is Intel Magnetics, Inc.

Conclusion

Carlo Ferrando’s patented process offers a targeted way to remove an epitaxial layer while preserving the wafer substrate for potential reuse.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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