Gothenburg, Sweden

Carl F Allerstam

This inventor holds 1 USPTO granted patent. Top assignee: Nxp B.v.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Carl F Allerstam. Retrieved from https://idiyas.com/inventor/carl-f-allerstam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Carl F Allerstam

Introduction

Carl F Allerstam is a notable inventor based in Gothenburg, Sweden. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods to enhance the performance of silicon carbide (SiC) devices. His innovative approach has led to advancements that are crucial for the efficiency of modern electronic components.

Latest Patents

One of Carl F Allerstam's key patents is titled "Method for improving inversion layer mobility in a silicon carbide MOSFET." This patent describes a method of manufacturing a semiconductor device based on a SiC substrate. The process involves forming an oxide layer on a Si-terminated face of the SiC substrate at an oxidation rate sufficiently high to achieve a near interface trap density below 5×10 cm. Additionally, the oxidized SiC substrate is annealed in a hydrogen-containing environment to passivate deep traps formed during the oxide-forming step. This innovative method enables the manufacturing of a SiC-based MOSFET with improved inversion layer mobility and reduced threshold voltage. It has been observed that the density of deep traps increases while the density of near interface traps decreases when the Si-face of the SiC substrate undergoes rapid oxidation. The deep traps formed during this rapid oxidation can be effectively passivated by hydrogen annealing, leading to a significantly decreased threshold voltage for the semiconductor device.

Career Highlights

Carl F Allerstam is currently associated with NXP B.V., a leading company in the semiconductor industry. His work at NXP has allowed him to focus on cutting-edge technologies that drive innovation in electronic devices. His expertise in semiconductor manufacturing processes has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Carl has collaborated with several talented individuals, including Thomas Christian Roedle and Gudjon I Gudjonsson. These collaborations have fostered an environment of innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

Carl F Allerstam's contributions to semiconductor technology, particularly through his patent on improving inversion layer mobility in silicon carbide MOSFETs, highlight his role as an influential inventor in the field. His work continues to impact the efficiency and performance of modern electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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