Heidenheim, Germany

Carl-Ernst Eilers

This inventor holds 1 USPTO granted patent. Top assignee: Siemens Aktiengesellschaft. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Carl-Ernst Eilers. Retrieved from https://idiyas.com/inventor/carl-ernst-eilers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Carl-Ernst Eilers: Inventor in Cathode Sputtering Technology

Introduction

Carl-Ernst Eilers is an inventor associated with Heidenheim, Germany, and Siemens Aktiengesellschaft. His work includes an invention designed to support the cathode sputtering of multiple materials.

Latest Patents

Eilers is credited with 1 patent: “Device for Cathode Sputtering of at Least Two Different Materials.” The invention describes a cooled holder connected to a target through a heat-conducting layer. The target contains blind holes, with pins made from another material fitted into at least one hole so that the additional material can be incorporated during sputtering.

Career Highlights

Eilers’s patent reflects work on adapting sputtering equipment to handle more than one material. The patent record provided associates him with Siemens Aktiengesellschaft.

Collaborations

Horst Pachonik is identified as Eilers’s coworker. The available information does not specify the nature of their collaboration or whether Pachonik contributed to the patent.

Conclusion

Carl-Ernst Eilers’s recorded invention addresses a practical approach to sputtering multiple materials, combining a cooled holder, a heat-conducting layer, and material-bearing pins in a target.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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