Fremont, CA, United States of America

Cangshan Xu


Average Co-Inventor Count = 2.4

ph-index = 9

Forward Citations = 297(Granted Patents)


Company Filing History:


Years Active: 2001-2006

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19 patents (USPTO):Explore Patents

Title: Cangshan Xu: Innovator in Chemical Mechanical Planarization

Introduction

Cangshan Xu, based in Fremont, CA, is a prolific inventor with a remarkable portfolio of 19 patents. His work primarily focuses on advancements in chemical mechanical planarization (CMP), a critical process in semiconductor manufacturing. Xu's innovative approaches have significantly contributed to improving the efficiency and effectiveness of CMP technology.

Latest Patents

Cangshan Xu's latest patents include an impressive air platen assembly designed for leading edge and trailing edge control. This assembly features a platen consisting of concentric rings with numerous openings, generating a cushion of air for a CMP belt. Notably, at least one of the rings extends beyond the wafer's outer edge to enhance planarization efficiency. The design incorporates a support attached to the platen, equipped with air ports for delivering pressurized air.

Additionally, he developed a method utilizing neural networks to refine chemical mechanical planarization processes. This method employs a first neural network to estimate CMP results and a second network to optimize control parameters, minimizing any discrepancies between the actual and desired CMP outcomes.

Career Highlights

Throughout his career, Cangshan Xu has made significant contributions to the field of semiconductor technology. He has worked with notable companies such as Lam Research Corporation, where his innovations have helped advance the company's capabilities in CMP processes. His extensive experience and insight into technological improvements have made him a respected figure in the industry.

Collaborations

Cangshan Xu has collaborated with several esteemed colleagues, including Eugene Yuexing Zhao and Fen Dai. Their collective efforts and shared expertise have further driven innovation and propelled advancements in chemical mechanical planarization techniques.

Conclusion

Cangshan Xu stands out as an influential inventor whose contributions to CMP technology are noteworthy. With a focus on innovating processes and tools, he continues to shape the future of semiconductor manufacturing. His impressive patent portfolio and collaborative spirit underline his significant impact in this high-tech field.

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