Can Duan

Title: Can Duan: Innovator in Integrated Circuit Technology

Introduction

Can Duan is a notable inventor based in Richardson, Texas. He has made significant contributions to the field of integrated circuit technology. His innovative approach has led to the development of a unique patent that enhances the functionality of integrated circuits.

Latest Patents

Can Duan holds a patent for an integrated circuit (IC) with matched thin film resistors. This patent describes a method of fabricating an IC that includes forming a dielectric layer on a substrate with multiple ICs. A thin-film resistor (TFR) layer is deposited on the dielectric layer, followed by the formation of an underlayer (UL) that includes carbon. A hard mask layer made of silicon is then created on the UL. The process involves masked etching to transfer patterns through various layers, ultimately resulting in a matched pair of TFRs that are configured together for implementing specific functions.

Career Highlights

Can Duan is currently employed at Texas Instruments Corporation, a leading company in semiconductor technology. His work at Texas Instruments has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in integrated circuit design.

Collaborations

Can Duan has collaborated with several talented individuals in his field, including Scott William Jessen and Tae S Kim. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Can Duan's contributions to integrated circuit technology through his patent and work at Texas Instruments Corporation highlight his role as an influential inventor. His innovative methods continue to shape the future of semiconductor technology.