Calvin Cheung

Title: The Innovative Contributions of Calvin Cheung

Introduction

Calvin Cheung is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology. His work focuses on the development of advanced substrates and packaging methods that enhance electrical connections.

Latest Patents

Calvin Cheung holds a patent for a "Substrate having single patterned metal layer, and package applied with the substrate, and methods of manufacturing of the substrate and package." This innovative substrate features a patterned base with multiple apertures, allowing for effective electrical connections. The design includes a patterned metal layer and a first surface finish layer, which enhances the functionality of the contact pads for both downward and upward electrical connections.

Career Highlights

Calvin Cheung is currently employed at Advanced Semiconductor Engineering, Inc. His role involves the research and development of semiconductor packaging solutions. With a focus on innovation, he has successfully contributed to the advancement of technology in this field.

Collaborations

Throughout his career, Calvin has collaborated with esteemed colleagues such as Bernd Karl Appelt and William T Chen. These partnerships have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Calvin Cheung's contributions to semiconductor technology exemplify the spirit of innovation. His patent and work at Advanced Semiconductor Engineering, Inc. highlight his commitment to enhancing electrical connection methods. His achievements continue to influence the industry positively.