Caijun Su

Title: The Innovations of Caijun Su

Introduction

Caijun Su is a notable inventor based in San Jose, CA. He has made significant contributions to the field of metrology, particularly in the context of extreme ultraviolet (EUV) light sources. His innovative work has led to the development of advanced technologies that enhance the precision of measurements in various applications.

Latest Patents

One of Caijun Su's key patents is titled "Confocal Chromatic Metrology for EUV Source Condition Monitoring." This patent describes a light source that includes a rotatable drum coated with xenon ice, which is illuminated by a laser beam to produce plasma. The drum is designed to be translatable, allowing for enhanced functionality. The light source also features a confocal chromatic sensor that measures distances from the sensor to the rotatable drum. This sensor includes a head that focuses light onto the drum and detects reflected light, all while being housed within a vacuum chamber. This innovative approach significantly improves the monitoring of EUV sources.

Career Highlights

Caijun Su is currently employed at Kla Corporation, where he continues to push the boundaries of metrology technology. His work at Kla Corporation has positioned him as a key player in the development of advanced measurement systems that are crucial for the semiconductor industry.

Collaborations

Throughout his career, Caijun Su has collaborated with talented individuals such as Patrick Tae and Ravichandra Jagannath. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

Caijun Su's contributions to the field of metrology, particularly through his patent on confocal chromatic metrology, highlight his innovative spirit and dedication to advancing technology. His work at Kla Corporation and collaborations with esteemed colleagues further underscore his impact in the industry.