Yongin, South Korea

Byungsu Lee

This inventor holds 1 USPTO granted patent. Top assignees: Dongwoo Fine-Chem Co., Ltd., Samsung Display Co., Ltd.. Active years: 2022.


% Patents Active = 100.0

Average Co-Inventor Count = 14.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Byungsu Lee: Innovator in Thin Film Etchant Composition

Introduction

Byungsu Lee is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of materials science, particularly in the development of thin film etchant compositions. His innovative work has led to the creation of a patented solution that enhances the etching process in various applications.

Latest Patents

Byungsu Lee holds a patent for a "Thin film etchant composition and method of forming metal pattern by using the same." This invention focuses on a thin film etchant composition designed to prevent the re-adsorption of etched metal while ensuring uniform etching of thin films. The composition includes approximately 43 wt % to 46 wt % of phosphoric acid, 5 wt % to 8 wt % of nitric acid, 10 wt % to 17 wt % of acetic acid, 1 wt % to 3 wt % of iron nitrate, 0.7 wt % to 1.5 wt % of phosphate, and deionized water as the remaining component.

Career Highlights

Throughout his career, Byungsu Lee has worked with prominent companies in the industry. He has been associated with Samsung Display Co., Ltd. and Dongwoo Fine-Chem Co., Ltd., where he has contributed his expertise in materials and chemical engineering.

Collaborations

Byungsu Lee has collaborated with talented individuals in his field, including Jinhyung Kim and Joohwan Chung. These collaborations have further enriched his work and contributed to advancements in thin film technologies.

Conclusion

Byungsu Lee's innovative contributions to thin film etchant compositions demonstrate his commitment to advancing technology in materials science. His patent reflects a significant step forward in the etching process, showcasing his expertise and dedication to innovation.

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