Daejeon, South Korea

Byung-Soon Ryoo

This inventor holds 1 USPTO granted patent. Top assignee: Korea Institute of Machinery & Materials. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung-Soon Ryoo. Retrieved from https://idiyas.com/inventor/byung-soon-ryoo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Byung-Soon Ryoo: Innovator in Precision Overprinting Technology

Introduction

Byung-Soon Ryoo is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of printed electronics, particularly through his innovative methods in precision overprinting. His work focuses on enhancing the quality and accuracy of printed electronic patterns.

Latest Patents

Byung-Soon Ryoo holds a patent for a "Precision overprinting method of printed electronics rotary printing where location can be adjusted in real time." This invention addresses the challenges of accurately overprinting multilayered electronic patterns at a micrometer level. The method allows for real-time adjustments to the printing location, ensuring high precision and quality. It also includes a feature for verifying printing quality through the display of register marks and alignment states on a display device.

Career Highlights

Ryoo is affiliated with the Korea Institute of Machinery & Materials, where he continues to advance research in printed electronics. His work has been instrumental in developing technologies that improve the efficiency and effectiveness of electronic printing processes.

Collaborations

Some of his notable coworkers include Dong-Soo Kim and Jeong Dai Jo, who have collaborated with him on various projects related to printed electronics.

Conclusion

Byung-Soon Ryoo's innovative contributions to precision overprinting technology have the potential to significantly impact the field of printed electronics. His dedication to enhancing printing methods showcases the importance of innovation in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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