Byung Mook Weon

Title: Byung Mook Weon: Inventor in Plasma Coating and Cosmetic Film Analysis.

Introduction

Byung Mook Weon is an inventor based in Suwon-si, South Korea. His work includes technologies for modifying nanovesicle surfaces and objectively analyzing cosmetic film formulations. He is associated with 2 patents.

Latest Patents

One of Weon’s patents describes a plasma coating method for nanovesicle surfaces and a plasma jet device for carrying out the coating. The method uses plasma to change a nanovesicle’s surface charge from negative toward neutral, drawing on the interaction between neutral and negatively charged objects.

Another patent presents a PDMS-based analysis method for cosmetic film formulations. It uses a polymeric substrate with physical properties similar to skin and X-ray CT imaging to assess film deformation non-destructively. The approach is designed to quantify the degree of pulling in a cosmetic film after application of a cosmetic composition.

Career Highlights

Weon’s listed institutional affiliations include Sungkyunkwan University and Ajou University Industry-Academic Cooperation Foundation. His patent work spans plasma-based surface treatment and measurement techniques for cosmetic formulations.

Collaborations

His listed coworkers include Hyo Jin Heo and So Young Jung. Their names are associated with the collaborative research reflected in his patent work.

Conclusion

Byung Mook Weon’s inventions address practical methods for nanovesicle surface modification and objective evaluation of cosmetic films, reflecting a focus on applied research and measurement technologies.