The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Jul. 03, 2024
Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;
Ajou University Industry-academic Cooperation Foundation, Suwon-si, KR;
Ana Sofia Pereira De Brito, Suwon-si, KR;
Byeong Moon Kwak, Suwon-si, KR;
Bum Ho Bin, Suwon-si, KR;
Hyo Jin Heo, Suwon-si, KR;
Byung Sun Cha, Suwon-si, KR;
So Min Lee, Suwon-si, KR;
So Young Jung, Suwon-si, KR;
Lei Lei, Suwon-si, KR;
Sang Hun Lee, Suwon-si, KR;
Byung Mook Weon, Suwon-si, KR;
RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, Suwon-si, KR;
AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION, Suwon-si, KR;
Abstract
An embodiment of the disclosure provides a plasma coating method of a nanovesicle surface and a plasma jet device for plasma coating of a nanovesicle surface. The plasma coating method of a nanovesicle surface according to an embodiment of the disclosure may be provided as a simple method for changing the surface charge of a nanovesicle from negative to neutral by utilizing the characteristic that when a neutral object meets a negatively charged object, electrons of the neutral object repel electrons of the negatively charged object and the negatively charged object becomes positively charged.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile