Pyeongtaek-si, South Korea

Byung Jo Kim

This inventor holds 1 USPTO granted patent. Top assignee: Wonik Ips Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung Jo Kim. Retrieved from https://idiyas.com/inventor/byung-jo-kim-28h2ase1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Byung Jo Kim: Innovator in Substrate Processing Technology

Introduction

Byung Jo Kim is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Byung Jo Kim holds a patent for a substrate processing apparatus. This invention relates to a system that includes a gas utility designed to exhaust both the reaction space and the protective space. The apparatus facilitates a pressure change process that incorporates both high-pressure and low-pressure states, allowing for effective processing of multiple substrates introduced into the reaction space. He has 1 patent to his name.

Career Highlights

Throughout his career, Byung Jo Kim has been associated with Wonik Ips Co., Ltd., where he has played a pivotal role in advancing substrate processing technologies. His work has been instrumental in improving the efficiency and effectiveness of substrate processing methods.

Collaborations

Byung Jo Kim has collaborated with several talented individuals in his field, including Seung Seob Lee and Jeong Lim Son. These collaborations have contributed to the development of innovative solutions in substrate processing.

Conclusion

Byung Jo Kim's contributions to substrate processing technology highlight his role as an influential inventor. His patent for a substrate processing apparatus showcases his commitment to innovation and efficiency in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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