Byung-ha Park

This inventor holds 23 USPTO granted patents and 2 published patent applications, primarily in Inkjet Printhead Technology. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2004-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung-ha Park. Retrieved from https://idiyas.com/inventor/byung-ha-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 (Patent Applications = 2)

% Patents Active = 21.7

Average Co-Inventor Count = 4.5

ph-index = 5

Forward Citations = 56(Granted Patents)

Location History:

Gyeonggi-do, KR (2004 - 2009)
Suwon-si, KR (2006 - 2021)

Company Filing History:

23 out of 132,108

Samsung Electronics Co., Ltd.

patents

Years Active: 2004-2021

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Areas of Expertise:

Inkjet Printhead

Manufacturing Method

Photoresist Composition

Coating Film

Conductive Epoxy Resin

Hydrophobic Layer

Droplet Ejecting Portion

Filter Plate

Oxetane-Containing Compound

Monolithic Inkjet Printhead

Patterning Method

23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10961364 - Cover window for protecting display panel, display device using same, and cover window manufacturing method (2021-03-30),

2. 10809423 - Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film (2020-10-20),

3. 9637644 - Composition for coating film to prevent conspicuous fingerprints, coating film to prevent conspicuous fingerprints using the composition, and article having the coating film (2017-05-02),

4. 8303084 - Inkjet printhead and method of manufacturing the same (2012-11-06),

5. 8293123 - Method of manufacturing inkjet printhead and inkjet printhead manufactured using the same (2012-10-23),

6. 8163463 - Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head (2012-04-24),

7. 8147037 - Inkjet printhead and method of manufacturing the same (2012-04-03),

8. 7934811 - Inkjet printhead having conductive epoxy resin (2011-05-03),

9. 7854493 - Method of manufacturing inkjet printhead and inkjet printhead manufactured using the method (2010-12-21),

10. 7607759 - Inkjet printhead and method of manufacturing the same (2009-10-27),

11. 7524610 - Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound (2009-04-28),

12. 7513605 - Inkjet printhead with heat generating resistor (2009-04-07),

13. 7484835 - Filter plate usable with an ink jet head, an ink jet head with the filter plate, and a method of fabricating the filter plate (2009-02-03),

14. 7481942 - Monolithic ink-jet printhead and method of manufacturing the same (2009-01-27),

15. 7354521 - Method of fabricating inkjet print head using photocurable resin composition (2008-04-08),

Title: Innovations of Byung-ha Park: Pioneering Advancements in Display Technologies

Introduction: Byung-ha Park, a prolific inventor based in Suwon-si, South Korea, is renowned for his significant contributions to the field of display technologies. With an impressive portfolio of 23 patents, Park has consistently driven innovation within the industry.

Latest Patents: Two of Byung-ha Park's latest patents are particularly noteworthy. The first patent focuses on a cover window designed to protect display panels. This innovative cover window features a transparent sheet that allows light from the display panel to pass through, while incorporating nano-inorganic particles to enhance its durability. The second patent addresses a coating film designed to prevent conspicuous fingerprints on surfaces. This coating film boasts a water contact angle of no less than 60 degrees, facilitating the evaporation of water from fingerprints. Additionally, it exhibits lipophilicity with a diiodomethane contact angle of no more than 45 degrees, effectively enhancing its affinity for oily fingerprint components.

Career Highlights: Byung-ha Park is currently affiliated with Samsung Electronics Co., Ltd., where his skills and innovative mindset have been instrumental in developing advanced display technologies. His dynamic approach to problem-solving has earned him recognition within the industry, reinforcing Samsung's position as a leader in display innovation.

Collaborations: Throughout his career, Park has collaborated with notable colleagues, including Young-ung Ha and Jae-sik Min. These partnerships have fostered a collaborative environment that encourages innovation and the advancement of technology within the research and development teams at Samsung.

Conclusion: Byung-ha Park's contributions to the field of display technologies through his inventive solutions and collaborative spirit highlight his dedication to innovation. With his remarkable track record and continued commitment to advancing technology, Park remains a vital figure in shaping the future of display systems.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

2 patents pending: