The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2012

Filed:

Feb. 29, 2008
Applicants:

Jin-baek Kim, Daejeon-si, KR;

Byung-ha Park, Suwon-si, KR;

Kyu-sik Kim, Yongin-si, KR;

Young-ung Ha, Suwon-si, KR;

Su-min Kim, Daejeon-si, KR;

Inventors:

Jin-baek Kim, Daejeon-si, KR;

Byung-ha Park, Suwon-si, KR;

Kyu-sik Kim, Yongin-si, KR;

Young-ung Ha, Suwon-si, KR;

Su-min Kim, Daejeon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); B41J 2/05 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.


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