Byoung Jae Park

Title: Byoung Jae Park - Innovator in Plasma Etching Technology

Introduction

Byoung Jae Park is an accomplished inventor located in Hwaseong-si, South Korea. With a focus on innovative technology, Park has developed a unique method that addresses challenges in the field of plasma etching. His contributions to the industry are currently recognized through his patent.

Latest Patents

Byoung Jae Park holds a patent for the "Method of treating a layer." This inventive concept provides a method to completely remove damaged regions of a surface on an etch target layer after plasma etching. The process includes a first post-etch plasma treatment, utilizing a specific gas, allowing for effective surface restoration. The innovative step involves aligning the ionic polarity of the first post-treatment gas with that of the bias power applied in the plasma apparatus, enhancing the efficacy of the treatment process.

Career Highlights

Park is a key member of the team at Samsung Electronics Co., Ltd., where he has made significant strides in the development of plasma etching technologies. His expertise and creativity in this field have established him as a notable inventor within the organization.

Collaborations

Throughout his career, Byoung Jae Park has collaborated with prominent colleagues, including Kwangsu Kim and Yongsun Ko. Together, they work aims to push the frontiers of technology and innovation in plasma processing.

Conclusion

Byoung Jae Park’s innovative approach to plasma etching technology exemplifies the spirit of invention in the modern age. His patented methods promise to improve efficiencies in the semiconductor industry, highlighting his contributions to Samsung Electronics and the wider tech community.