Seoul, South Korea

Byoung-Hak Hong

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.8

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016-2024

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5 patents (USPTO):Explore Patents

Title: Byoung-Hak Hong: Innovator in Integrated Circuit Technology

Introduction

Byoung-Hak Hong is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of integrated circuit technology, holding a total of five patents. His work focuses on advancing the design and fabrication methods of integrated circuit devices.

Latest Patents

One of Byoung-Hak Hong's latest patents involves integrated circuit devices and methods of fabricating such devices. This patent describes an integrated circuit device that includes a plurality of channel regions spaced apart in an active region, along with multiple source/drain regions. The device features an insulating structure that defines several gate spaces, a first gate stack structure containing a first work function metal layer, and an isolation stack structure designed to electrically isolate a portion of the active region. This innovative approach enhances the performance and efficiency of integrated circuits.

Career Highlights

Byoung-Hak Hong is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His role at Samsung has allowed him to collaborate with other talented professionals in the field, furthering advancements in integrated circuit technology.

Collaborations

Some of his notable coworkers include Dae-Won Ha and Sung-il Park. Their collaborative efforts contribute to the innovative environment at Samsung Electronics, fostering the development of cutting-edge technologies.

Conclusion

Byoung-Hak Hong's contributions to integrated circuit technology exemplify the impact of innovation in the electronics industry. His patents reflect a commitment to enhancing device performance and efficiency, solidifying his reputation as a leading inventor in his field.

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