Hong Kong, China

Burly K Tan

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Polyu Technology and Consultancy Company Limited. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Burly K Tan. Retrieved from https://idiyas.com/inventor/burly-k-tan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Burly K Tan: Innovator in RFID Technology

Introduction

Burly K Tan is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of RFID technology, particularly in optimizing the deployment of RFID systems. His innovative approach has garnered attention in the industry.

Latest Patents

Burly K Tan holds a patent for a "Method for optimizing RFID deployment and RFID deployment optimizer of use thereof." This patent outlines a method that includes analyzing the interrogation zone where RFID apparatus are deployed, identifying the readability of RFID tags associated with different sets of placements on a target object, and selecting the best deployment alternative based on the analysis results.

Career Highlights

Burly K Tan is associated with PolyU Technology and Consultancy Company Limited, where he applies his expertise in RFID technology. His work focuses on enhancing the efficiency and effectiveness of RFID systems in various applications.

Collaborations

Some of his coworkers include Siu Keung Kwok and Wing Bun Lee, who contribute to the innovative environment at PolyU Technology and Consultancy Company Limited.

Conclusion

Burly K Tan's contributions to RFID technology through his patent and work at PolyU Technology and Consultancy Company Limited highlight his role as an innovator in the field. His methods for optimizing RFID deployment are paving the way for advancements in this technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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