North Plainfield, NJ, United States of America

Brymer H Chin

This inventor holds 3 USPTO granted patents. Top assignees: At&t Bell Laboratories, American Telephone & Telegraph Co., At&t Bell Laboratories. Active years: 1985-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Brymer H Chin. Retrieved from https://idiyas.com/inventor/brymer-h-chin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.9

ph-index = 3

Forward Citations = 53(Granted Patents)


Location History:

  • Somerset County, NJ (US) (1986)
  • North Plainfield, NJ (US) (1985 - 1987)

Company Filing History:


Years Active: 1985-1987

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3 patents (USPTO):Explore Patents

Title: The Innovations of Brymer H Chin

Introduction

Brymer H Chin is a notable inventor based in North Plainfield, NJ (US). He has made significant contributions to the field of technology, particularly in the area of light-emitting devices and semiconductor growth processes. With a total of 3 patents, his work has had a lasting impact on the industry.

Latest Patents

One of his latest patents is the "Multiple meltback procedure for LPE growth on InP." This innovative procedure describes a method for removing gross contaminants and thermal degradation from InP-containing surfaces. Prior to liquid phase epitaxy (LPE) growth on an InP substrate, the substrate surface is briefly brought into contact with an essentially pure indium melt, followed by contact with a slightly undersaturated In/P melt. Additionally, a similar triple meltback procedure is described for use prior to LPE growth over a mesa, which is particularly useful in the fabrication of buried heterostructures.

Another significant patent is for "Multiple wavelength light emitting devices." This invention presents a dual wavelength structure wherein two edge-emitting devices are bonded with their p-regions adjacent. The bonding medium is a conductive compound that forms a common electrode between the devices, allowing each device to be separately addressable. Efficient coupling of emitted light into a single fiber is achieved by restricting the vertical and horizontal separation of the light-emitting stripes.

Career Highlights

Brymer H Chin has worked with prestigious organizations such as AT&T Bell Laboratories and American Telephone & Telegraph Company. His experience in these companies has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Throughout his career, Brymer has collaborated with notable individuals, including Aland K Chin and Irfan Camlibel. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.

Conclusion

Brymer H Chin's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in light-emitting devices and semiconductor processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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