Munich, Germany

Bruno Spuler


Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 39(Granted Patents)


Location History:

  • Wappinger Falls, NY (US) (2002)
  • Weixdorf, DE (2003)
  • München, DE (2003 - 2006)

Company Filing History:


Years Active: 2002-2006

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5 patents (USPTO):

Title: The Innovative Mind of Bruno Spuler

Introduction

Bruno Spuler, an accomplished inventor based in Munich, Germany, has made significant contributions to the field of semiconductor technology. With a portfolio of five patents to his name, Spuler's work focuses on enhancing the efficiency and effectiveness of semiconductor devices, particularly in memory applications.

Latest Patents

Bruno Spuler's latest patents showcase his innovative approach to semiconductor design and manufacturing. One notable patent describes a method of forming an isolation layer and manufacturing a trench capacitor. This process utilizes a two-step etch technique that creates a vertical collar oxide within the trench capacitor, with the first step involving CF/SiF/O chemistry to open the bottom of the trench collar. The second stage employs CF chemistry to eliminate any residual silicon oxide. This method ensures uniformity in the thickness of the PAD-nitride layer and guarantees an adequate collar oxide thickness, making it particularly useful for deep trench capacitors in dynamic random-access memory (DRAM) devices.

Another significant patent focuses on a semiconductor device with a self-aligned contact and the corresponding manufacturing method. In this invention, a first and a second conductor are established on a semiconductor substrate's surface. Both conductors are enveloped by encapsulants that include materials such as titanium oxide, boron nitride, silicon carbide, magnesium oxide, or carbon, which serve as self-aligning etch masks for creating contact holes between the conductors.

Career Highlights

Throughout his career, Bruno Spuler has worked with prominent companies, most notably Infineon Technologies AG. His experience in this industry has propelled him to the forefront of semiconductor innovation, allowing him to refine his expertise and contribute to groundbreaking technologies.

Collaborations

Spuler is known for collaborating with talented professionals in his field, including Alois Gutmann and Uwe Paul Schroeder. These partnerships have fostered a creative environment for developing advanced semiconductor technologies, highlighting the importance of teamwork in driving innovation.

Conclusion

Bruno Spuler's inventive spirit and dedication to semiconductor technology continue to influence the industry. His recent patents underscore his ability to address complex engineering challenges, making a lasting impact on the development of efficient and reliable semiconductor devices. As technology advances, Spuler's contributions will undoubtedly remain significant in shaping the future of electronic devices.

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