Center Harbor, NH, United States of America

Bruce R Jenket

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ipg Microsystems LLC. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bruce R Jenket. Retrieved from https://idiyas.com/inventor/bruce-r-jenket

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Bruce R. Jenket: Innovator in Gas Lasing Technology

Introduction

Bruce R. Jenket is a notable inventor based in Center Harbor, NH (US). He has made significant contributions to the field of gas lasing devices, particularly through his innovative patent that addresses the challenges of gas replenishment in these systems.

Latest Patents

Jenket holds a patent for "Continuous mass flow gas replenishment for gas lasing devices." This invention allows for the effective replenishment of gases in gas lasers or amplifiers by utilizing a restrictive orifice. The method ensures that gases are added as needed, maintaining the total pressure and constituent partial pressures within a desired range throughout the operational lifetime of the device. This approach is less complicated and more cost-effective compared to other continuous flow methodologies.

Career Highlights

Bruce R. Jenket is associated with Ipg Microsystems LLC, where he applies his expertise in gas lasing technology. His work has contributed to advancements in the efficiency and functionality of gas lasing devices.

Collaborations

Some of his coworkers include Jeffrey P. Sercel and Dana K. Sercel, who have likely collaborated with him on various projects within the field.

Conclusion

Bruce R. Jenket's innovative work in gas lasing technology exemplifies the importance of continuous advancements in the field. His patent for continuous mass flow gas replenishment showcases his commitment to improving the efficiency of gas lasing devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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