The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2014
Filed:
Nov. 23, 2012
Ipg Microsystems Llc, Manchester, NH (US);
Jeffrey P. Sercel, Hollis, NH (US);
Dana K. Sercel, Bedford, NH (US);
Michael Von Dadelszen, Merrimack, NH (US);
Daniel B. Masse, Windham, NH (US);
Bruce R. Jenket, Center Harbor, NH (US);
IPG Microsystems LLC, Manchester, NH (US);
Abstract
Continuous mass flow gas replenishment may be implemented in a gas lasing device, such as a gas laser or amplifier, by using a restrictive orifice to bleed one or more gases into a reservoir and/or discharge chamber of the gas laser or amplifier at a predefined mass flow rate. The mass flow rate is a function of the pressure drop across the restrictive orifice resulting from the pressure differential between the depleted gas and the source gas. Thus, gases may be added as needed such that the gas total pressure, as well as the constituent partial pressures, is maintained within a desired range throughout the laser or amplifier fill lifetime. The continuous mass flow gas replenishment may thus make up the lost partial pressure of reactive gases in gas lasing devices in a manner that is less complicated and is less expensive than other continuous flow methodologies.