This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Envea UK Ltd. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Bruce Greetham: Innovator in Particle Flow Monitoring
Introduction
Bruce Greetham is a notable inventor based in Cambridgeshire, GB. He has made significant contributions to the field of particle monitoring technology. His innovative approach has led to the development of a unique patent that addresses the challenges associated with monitoring particle flow in stacks.
Latest Patents
Greetham holds a patent for an "Apparatus and method for monitoring particle flow in a stack." This invention involves a method and apparatus designed to monitor particles flowing in a stack. The method includes emitting light from a light source along an optical path for scattering from the particles. A rotatable monitoring assembly is mounted in the optical path, which detects the scattered light using a detector. The assembly features at least two apertures and can be rotated into various configurations, including operational, zero-check, span-check, and contamination-check configurations. This innovative design ensures accurate monitoring while protecting optical components from particles in the stack.
Career Highlights
Throughout his career, Bruce Greetham has worked with several companies, including Envea UK Ltd and PCME Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in particle monitoring technology.
Collaborations
Greetham has collaborated with notable professionals in his field, including Trevor Allan Lye and David Christopher Unitt. These collaborations have further enhanced his work and contributed to the development of innovative solutions in particle monitoring.
Conclusion
In summary, Bruce Greetham is a distinguished inventor whose work in particle flow monitoring has made a significant impact in the field. His patent showcases his innovative approach and dedication to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile