The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2023

Filed:

Jul. 28, 2017
Applicant:

Envea Uk Ltd, Cambridge, GB;

Inventors:

David Christopher Unitt, Swaffham Prior, GB;

Trevor Allan Lye, Cambridgeshire, GB;

Bruce Greetham, Cambridgeshire, GB;

Assignee:

ENVEA UK Ltd, Cambridge, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/10 (2006.01); G01N 21/15 (2006.01); G08B 17/107 (2006.01); G01N 21/53 (2006.01); G01N 15/02 (2006.01); G01F 1/74 (2006.01); G01N 15/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/15 (2013.01); G01F 1/74 (2013.01); G01N 15/0205 (2013.01); G01N 15/10 (2013.01); G01N 21/53 (2013.01); G08B 17/107 (2013.01); G01N 2015/0096 (2013.01); G01N 2015/1075 (2013.01); G01N 2021/536 (2013.01); G01N 2201/024 (2013.01); G01N 2201/1047 (2013.01); G01N 2201/12707 (2013.01);
Abstract

A method and apparatus () for monitoring particles flowing in a stack are disclosed. The method comprises emitting light from a light source along an optical path for scattering from the particles, rotating a rotatable monitoring assembly () mounted in the optical path, and detecting the scattered light using a detector. The rotatable monitoring assembly () contains at least two in apertures, and the method further comprises rotating the rotatable monitoring assembly () into a plurality of different configurations. In an operation configuration, light passes through the rotatable monitoring assembly () and into the stack unimpeded. In a zero-check configuration, the rotatable monitoring assembly () blocks the light from reaching the stack. In a span-check configuration, light of varying intensity passes from the light source through the rotatable monitoring assembly () into the stack. In a contamination-check configuration, the light is reflected through the rotatable monitoring assembly () onto the detector, without entering the stack. In the safety-shutter configuration, the rotatable monitoring assembly () protects optical components in the instrument from particles in the stack.


Find Patent Forward Citations

Unitt, David. (2023). Apparatus and method for monitoring particle flow in a stack (U.S. Patent No. 11609179). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11609179

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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