Company Filing History:
Years Active: 2025
Title: Brittany Johnson: Innovator in Chemical-Mechanical Polishing
Introduction
Brittany Johnson is a talented inventor based in Wood Dale, IL (US). She has made significant contributions to the field of chemical-mechanical polishing, holding 2 patents that showcase her innovative approach to substrate polishing techniques.
Latest Patents
Her latest patents include a composition and method for polishing boron-doped polysilicon. This invention provides a method of chemically mechanically polishing a substrate, particularly one comprising boron-doped polysilicon. The method involves contacting the substrate with a chemical-mechanical polishing composition that includes an abrasive selected from α-alumina, silica, and a combination thereof, along with ferric ion, an organic acid, and water. Additionally, she has developed a polishing composition and method with high selectivity for silicon nitride and polysilicon over silicon oxide. This invention features a chemical-mechanical polishing composition that includes ceria particles, a cationic polymer, a quaternary ammonium salt or a quaternary phosphonium salt, and water, with a pH of about 5 to about 8.
Career Highlights
Brittany works at CMC Materials, Inc., where she applies her expertise in developing advanced polishing solutions. Her work has significantly impacted the efficiency and effectiveness of substrate polishing processes in various applications.
Collaborations
Some of her notable coworkers include Benjamin Petro and Juyeon Chang, with whom she collaborates to drive innovation in her field.
Conclusion
Brittany Johnson is a remarkable inventor whose contributions to chemical-mechanical polishing are paving the way for advancements in substrate processing. Her innovative patents reflect her dedication to improving industry standards and practices.