Meylan, France

Brigitte Descouts


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Brigitte Descouts: A Pioneer in Semiconductor Technology

Introduction

Brigitte Descouts, an innovative inventor based in Meylan, France, has made significant contributions to the field of semiconductor technology. With a total of two patents, her work focuses on methods to enhance the fabrication of integrated circuits and improve dielectric material deposition.

Latest Patents

Among her latest patents is a groundbreaking method for depositing a silicon-containing dielectric material on copper. This inventive process involves placing a structure within a Chemical Vapor Deposition (CVD) chamber and adding gases that work synergistically to create a dielectric material while preventing contamination of copper. In addition, she holds a patent for a process of fabricating integrated circuits, which includes multiple steps such as etching, barrier layer deposition, and copper filling. This innovative approach integrates titanium to enhance the conductivity of the resulting metal tracks.

Career Highlights

Brigitte has had a distinguished career, contributing her expertise to notable organizations, including the French Alternative Energies and Atomic Energy Commission (Commissariat à l'Energie Atomique). Her work has positioned her as a respected figure in the semiconductor research community, with an emphasis on enhancing the functional capabilities of electronic devices.

Collaborations

Throughout her career, Brigitte has collaborated with esteemed colleagues, including Pascale Motte and Srdjan Kordic. These collaborations have bolstered her projects and contributed to the advancement of innovative techniques in semiconductor manufacturing.

Conclusion

Brigitte Descouts stands out as a leading inventor in the semiconductor industry. Her patents reflect a commitment to pushing the boundaries of technology, particularly in the areas of integrated circuit fabrication and dielectric material processing. As her career progresses, her contributions are expected to continue shaping the future of semiconductor innovations.

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