Brian Zaccheo

Title: Brian Zaccheo: Innovator in EUV Lithography

Introduction

Brian Zaccheo is a notable inventor based in Hillsboro, Oregon. He has made significant contributions to the field of extreme ultraviolet (EUV) lithography, which is crucial for advanced semiconductor manufacturing. His innovative techniques and materials have the potential to enhance the reliability and precision of lithographic processes.

Latest Patents

Brian Zaccheo holds a patent for "EUV patterning methods, structures, and materials." This patent discusses various techniques, structures, and materials related to EUV lithography. It includes multiple patterning methods, such as first patterning a grating of parallel lines and second patterning utilizing EUV lithography to form plugs in the grating. The patent also describes optional trimming of the plugs, EUV resists, surface treatments, resist additives, and processing techniques that improve processing reliability, feature definition, and critical dimensions.

Career Highlights

Brian Zaccheo is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has allowed him to be at the forefront of advancements in lithography techniques, contributing to the development of next-generation technologies.

Collaborations

Throughout his career, Brian has collaborated with talented individuals such as Marie Krysak and James M Blackwell. These collaborations have fostered an environment of innovation and have led to significant advancements in the field of EUV lithography.

Conclusion

Brian Zaccheo's contributions to EUV lithography exemplify the importance of innovation in technology. His patent and work at Intel Corporation highlight his role as a key player in advancing semiconductor manufacturing techniques.