Brian T Kearney

Title: Innovations of Brian T Kearney

Introduction

Brian T Kearney is an accomplished inventor based in Martinez, CA (US). He has made significant contributions to the field of materials science, particularly in the development of thin films. His innovative work has led to the creation of a patented method that enhances the production of titanium nitride thin films.

Latest Patents

Kearney holds a patent for "High temperature sputtered stoichiometric titanium nitride thin films." This patent describes a method for producing high-temperature sputtered stoichiometric TiN thin films. The process involves placing a substrate in a sputtering chamber with a titanium target. The substrate temperature is controlled to be between room temperature and about 800°C. The sputtering chamber is evacuated to a base pressure of 2×10 Torr or lower. The titanium target is presputtered under an argon gas flow at a pressure of 2-15 mTorr using radio frequency (RF) power of 50-200 W. Subsequently, titanium is sputtered onto the substrate in the presence of nitrogen and argon gas flows under the same pressure and RF power, with the ratio of nitrogen to argon favoring nitrogen to ensure that the film is nitrogen-saturated. Kearney's innovative approach has the potential to advance various applications in electronics and coatings.

Career Highlights

Brian T Kearney works for the United States as represented by the Secretary of the Navy. His role involves significant research and development efforts that contribute to national defense and technological advancements. Kearney's expertise in materials science has positioned him as a valuable asset in his field.

Collaborations

Kearney has collaborated with notable colleagues, including Xiao Liu and Battogtokh Jugdersuren. These collaborations have fostered a productive environment for innovation and research, leading to advancements in their respective areas of expertise.

Conclusion

Brian T Kearney's contributions to the field of materials science, particularly through his patented method for producing titanium nitride thin films, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.