Brian Osborn

Title: Brian Osborn - Innovator in Semiconductor Technology

Introduction

Brian Osborn is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Brian Osborn holds a patent for "Selective contact formation using masking and resist patterning techniques." This patent describes a method for manufacturing a semiconductor device that includes selective conductive contacts. The process involves depositing a resist over first and second memory device components, which comprise junctions formed in the substrate and a gate formed on the substrate between the junctions. The resist is then removed from the second components to create openings above the control gates and junctions. Following this, the resist is etched to expose the first component control gates while protecting the surrounding substrate. Finally, conductive contacts are formed on the exposed first component control gates, as well as the second component control gates and junctions. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Brian Osborn has made a significant impact in his field, with a total of 1 patent to his name. His work at Spansion LLC has positioned him as a key player in the semiconductor industry, where he continues to push the boundaries of technology.

Collaborations

Brian has collaborated with talented individuals such as Kyunghoon Min and Mark S Chang, contributing to advancements in semiconductor technology.

Conclusion

Brian Osborn's innovative work in semiconductor technology exemplifies the spirit of invention and progress in the industry. His contributions continue to influence the field and inspire future innovations.