This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Innovation Ulster Limited. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Brian Joseph Meenan - Innovator in Plasma Technology
Introduction
Brian Joseph Meenan is a notable inventor based in Lisburn, GB, known for his innovative contributions to surface modification technologies. With a focus on enhancing substrate characteristics, Meenan has developed unique methods that leverage plasma technology for advanced applications.
Latest Patents
Meenan holds a patent for a groundbreaking invention titled "Plasma Based Surface Augmentation Method." This method involves modifying a substrate through a strategic arrangement of electrodes, allowing for the rotation of either the substrate or one of the electrodes. This innovative process ensures that various portions of the substrate pass between the electrodes, wherein a voltage induces a plasma discharge that selectively modifies the substrate. The unique design allows for variability in the speed of transit and plasma discharge effectiveness across the substrate.
Career Highlights
Brian Meenan is associated with Innovation Ulster Limited, an organization dedicated to fostering cutting-edge research and innovation. His work focuses on developing advanced techniques that improve material properties, demonstrating a strong commitment to advancing technology in his field.
Collaborations
Throughout his career, Meenan has collaborated with colleagues such as Cormac Patrick Byrne and Raechelle Andrea D'Sa. These collaborations reflect a collaborative spirit and the importance of teamwork in the pursuit of innovation.
Conclusion
Brian Joseph Meenan exemplifies the essence of innovation in the field of plasma technology with his patented method for surface augmentation. His contributions continue to inspire advancements in material science and pave the way for future developments in substrate modification technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile