Ballston Spa, NY, United States of America

Brian J O'Hara

This inventor holds 2 USPTO granted patents. Top assignee: Praxair Technology, Inc.. Active years: 2013-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Brian J O'Hara. Retrieved from https://idiyas.com/inventor/brian-j-o-hara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Harriman, NY (US) (2013)
  • Balston Spa, NY (US) (2015)

Company Filing History:


Years Active: 2013-2015

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2 patents (USPTO):Explore Patents

Title: Brian J O'Hara: Innovator in Sputter Target Technology

Introduction

Brian J O'Hara is a notable inventor based in Balston Spa, NY (US). He has made significant contributions to the field of sputter target technology, holding two patents that showcase his innovative approach to engineering.

Latest Patents

O'Hara's latest patents include a method for forming sputter target assemblies with a controlled solder thickness. This invention relates to a method and apparatus that introduces a bonding foil between the backing plate and the sputter target. The bonding foil is designed as an ignitable heterogeneous stratified structure that facilitates the propagation of an exothermic reaction. This innovative approach enhances the efficiency and effectiveness of sputter target assemblies.

Career Highlights

Brian J O'Hara is currently employed at Praxair Technology, Inc., where he continues to develop and refine technologies related to sputter targets. His work has been instrumental in advancing the capabilities of materials used in various applications.

Collaborations

O'Hara has collaborated with notable colleagues such as Paul S Gilman and Binu Mathew, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Brian J O'Hara's contributions to sputter target technology exemplify his commitment to innovation and engineering excellence. His patents reflect a deep understanding of materials science and engineering principles, making him a valuable asset in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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