Company Filing History:
Years Active: 2004-2007
Title: Brian Cousineau: Innovator in Semiconductor Technology
Introduction
Brian Cousineau is a prominent inventor based in Burlington, NC (US). He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and performance of dynamic random access memory (DRAM) structures.
Latest Patents
Among his latest patents is the invention titled "High density DRAM with reduced peripheral device area and method of manufacture." This patent discloses a DRAM structure that features a distance of less than 0.14 um between the contacts to silicon and the gate conductor. Additionally, it includes a method for forming this structure, which involves creating the DRAM array contacts and the contacts to silicon simultaneously. Another notable patent is "Maskless middle-of-line liner deposition," which describes a process for fabricating a semiconductor structure. This process allows for the controlled deposition of a middle-of-line liner using plasma enhanced chemical vapor deposition, optimizing the amount of liner deposited in both the core and periphery regions of the semiconductor structure.
Career Highlights
Brian Cousineau is currently employed at Infineon Technologies AG, where he continues to innovate in the semiconductor industry. His expertise in DRAM technology and semiconductor fabrication processes has positioned him as a key player in his field.
Collaborations
Throughout his career, Brian has collaborated with notable colleagues, including Michael Maldei and Guenter Gerstmeier. These collaborations have further enhanced his contributions to semiconductor technology.
Conclusion
Brian Cousineau's work in semiconductor technology, particularly in the development of advanced DRAM structures, showcases his innovative spirit and dedication to improving electronic components. His patents reflect a commitment to pushing the boundaries of technology and enhancing performance in the industry.