Millbrook, NY, United States of America

Brian C O'Neill


Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 145(Granted Patents)


Company Filing History:


Years Active: 1982-1987

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4 patents (USPTO):

Title: Innovations by Brian C O'Neill

Introduction

Brian C O'Neill is a notable inventor based in Millbrook, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work primarily focuses on high precision systems that enhance the capabilities of electron beam lithography tools.

Latest Patents

One of his latest patents is a "Workpiece mounting and clamping system having submicron positioning." This invention is a high precision, high throughput submicrometer workpiece positioning system, particularly useful in electron beam lithography tools. The system increases mechanical stability by essentially eliminating mechanical hysteresis, allowing for the repeatable, accurate, and dense circuit patterns that modern semiconductor trends demand. The positioning system includes a movable positioning table and a workpiece supporting superstructure, which is elastically joined to the table by three distinct kinematic support means. A laser interferometer is utilized for precise positioning, ensuring minimal mechanical distortion during workpiece mounting.

Another significant patent is the "Light actuating force elevator drive mechanism." This invention features an elevator drive shaft that is air pressure counter-balanced and dampened under varying load conditions. By applying the required air pressure to a piston moving with the drive shaft, the system minimizes vibratory shock and distortion to the electron beam writing system. This innovation allows for simultaneous electron beam writing on one wafer while loading or unloading a second semiconductor wafer, enhancing operational efficiency.

Career Highlights

Brian C O'Neill is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of electron beam lithography systems.

Collaborations

Throughout his career, O'Neill has collaborated with notable coworkers such as Alfred Mack and George Anthony Caccoma. Their combined expertise has contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Brian C O'Neill's contributions to semiconductor technology through his innovative patents have significantly impacted the field. His work at IBM and collaborations with esteemed colleagues highlight his commitment to advancing technology in electron beam lithography.

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