Boise, ID, United States of America

Brett Spaulding

USPTO Granted Patents = 1 

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Brett Spaulding: Innovator in Semiconductor Processing

Introduction

Brett Spaulding is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor processing, particularly in hydrogen management within plasma deposited films. His innovative work has led to the development of methods that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Brett holds a patent for "Hydrogen management in plasma deposited films." This patent outlines exemplary methods of semiconductor processing that include flowing a silicon-containing precursor into a processing region of a semiconductor processing chamber. The substrate is maintained at a temperature below or about 450° C, and the methods involve striking a plasma of the silicon-containing precursor. The result is the formation of a layer of amorphous silicon on a semiconductor substrate, characterized by less than or about 3% hydrogen incorporation. This innovation is crucial for improving the quality and performance of semiconductor devices.

Career Highlights

Brett Spaulding is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to focus on advancing semiconductor processing technologies. With a patent portfolio that includes 1 patent, he continues to push the boundaries of innovation in his field.

Collaborations

Brett has collaborated with talented coworkers such as Rui Cheng and Diwakar N Kedlaya. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Brett Spaulding is a distinguished inventor whose work in semiconductor processing has made a significant impact on the industry. His innovative approaches to hydrogen management in plasma deposited films exemplify the importance of research and development in advancing technology.

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