Applied Materials, Inc.

Brett Spaulding

Shashank Sharma

Kelvin Chan

Karthik Janakiraman

Rui Cheng

Zubin Huang

Diwakar N Kedlaya

Krishna Nittala

Gautam K Hemani

Alicia J Lustgraaf

Exemplary methods of semiconductor processing may include flowing a silicon-containing precursor into a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region, and the substrate may be maintained at a temperature below or about 450&#xb0; C. The methods may include striking a plasma of the silicon-containing precursor. The methods may include forming a layer of amorphous silicon on a semiconductor substrate. The layer of amorphous silicon may be characterized by less than or about 3% hydrogen incorporation.

Hydrogen management in plasma deposited films

Growing community of inventors

Boise, ID, United States of America

Brett Spaulding